a MEMS fabrication process, based on standard CMOS microelectronic processes, in which tiny polysilicon parts are photolithographically patterned with surrounding layers of silicon dioxide that can be etching away "releasing" the part
The MEMS fabrication process based on standard CMOS microelectronic processes. MEMS structures are photolithographically patterned in alternating layers of deposited polysilicon and silicon dioxide, and then are "released" by dissolving away the silicon dioxide layers.
An additive fabrication technique which involves the building of a device on the top surface of a supporting substrate. This technique is relatively independent of substrate; therefore, it can be easily mixed with other fabrication techniques which modify the substrate first.
A micromachining technology in which the microdevice is formed by adding layers of material on top of a supporting base or substrate (like painting on a canvas). Surface micromachined devices are usually one to three structural layers thick and are built on top of a silicon substrate. Surface micromachining is the most widely used technology for micromirrors. EFAB is also based on layers built on a substrate but can produce many tens of layers and produce more complex structures than surface, bulk, or LIGA micromachining.
An additive fabrication process, which involves the building of a device on the top surfaces of supporting substrates.
Surface micromachining is a process used to produce micromachinery or MEMS.