(sc) the light-sensitive organic polymer film spun onto wafers and "exposed" using high-intensity light through a mask. The exposed photoresist is dissolved with developers, leaving a pattern of photoresist which allows etching to take place in some areas while preventing it in others.
Layer, laminated onto the surface of a PCB, as part of a photo-printing process.
Typically, a liquid polymeric material that is patterned during a photolithographic process. The material is then imaged using a series of exposure, developing, and baking steps.
a light-sensitive chemical used to etch a three-dimensional mask onto the silicon wafers from which computer chips are made
a light-sensitive material that on exposure to ultra-violet light causes it to undergo a chemical reaction
a substance which is applied and cured onto a glass substrate. When photoresist is exposed to a laser, its physical state changes, thus, creating a pattern of pits.
A material which when properly applied to a substrate becomes sensitive to portions of the electromagnetic spectrum. When properly exposed and developed, substrate portions are masked with a high degree of integrity.
A ultraviolet light sensitive polymer that, together with the phototool, is used to 'print' the desired circuitry pattern onto the PCB.
the energy-sensitive material into which the mask pattern is transferred by incident energy (also called resist)
A light-sensitive material that is used to establish an image by exposure to light and chemical development.
is a light-sensitive organic polymer that is used in the photolithography process to develop a pattern which masks some areas of the film to protect them during the etch process.
A radiation-sensitive material that, when properly applied to a variety of substrates and then properly exposed to light and developed, masks portions of the substrate with a high degree of integrity.
A material that prevents etching or plating of the area it covers
A layer of material that will react when exposed to actinic energy, UV light (or x-ray, e-beam etc.). The resist layer exposed to UV light, in certain portions, undergoes a change in its solubility. It is then developed by washing it with a basic developer solution, thereby removing the non-irradiated (in a negative-tone resist) or irradiated (in a positive tone resist) portions.
A material that, when applied to any of a variety of substances, becomes sensitive to portions of the electromagnetic spectrum and, when properly exposed and developed, masks a portion of the material.
light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Photoresists are classified into two groups, positive resists, in which the exposed areas become more soluble in specific chemical solutions (resist developers) and are removed in the developing process, and negative resists, in which only the exposed areas become resistant to the developer, so the unexposed areas are removed during the developing process . http://en.wikipedia.org/wiki/Photoresist
A light-sensitive organic polymer that is exposed by the photolithography process, then developed to produce a pattern which identifies some areas of the film to be etched.
a photo sensitive chemical resistant to acid. Photoresists may be liquids that are spun onto wafers, or solid sheets that are rolled onto printed circuit boards.
A photoactive film also known as "resist." Liquid photoresist is applied to a wafer to create a thin, uniform film. This film reacts with light energy from the stepper to define a circuit or component pattern on the substrate.
A light-sensitive chemical used to coat silicon wafers during lithography. The photoresist makes the wafer like a photographic negative. The integrated circuit pattern is projected onto the coated wafer, and then the wafer is developed.
A substance which becomes soluble when exposed to ultraviolet light; used to help define circuit patterns during chip fabrication.
a substance that can be made to form a tough film by photographic process, used to mask electrical circuits before chemical etching.
Photoresist is a light-sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface.